EDI锛�Electrodeionization锛夋槸鍏堥��(j矛n)鐨勬按铏曠悊鎶�琛�(sh霉)锛屾槸灏囬浕婊叉瀽鍜岄洟瀛愪氦鎻涙妧琛�(sh霉)鏈夋(j墨)绲�(ji茅)鍚堝湪涓�璧风殑閫ｇ簩(x霉)闆婚櫎楣藉伐钘�锛屽苟閫氶亷(gu貌)姘撮浕瑙ｇ敘(ch菐n)鐢熺殑姘洟瀛愬拰姘哀鏍归洟瀛愬皪(du矛)瑁濆～妯�(sh霉)鑴傞��(j矛n)琛岄�ｇ簩(x霉)鍐嶇敓锛屽洜姝�EDI鍒舵按閬�(gu貌)绋嬩笉闇�閰�銆佸牽鍖栧(xu茅)钘ュ搧鍐嶇敓鍗冲彲閫ｇ簩(x霉)鍒跺彇楂樺搧璩�(zh矛)璧风磾姘�锛�EDI鎶�琛�(sh霉)鐨勬噳(y墨ng)鐢紝妯�(bi膩o)蹇楄憲姘磋檿鐞嗘妧琛�(sh霉)寰炲偝绲�(t菕ng)鏂规硶鍚戔�滅瘈(ji茅)绱勮硣婧�銆佺稜鑹茬挵(hu谩n)?锛侀挕鐢峰薄d鎶�琛�(sh霉)鐨勮綁(zhu菐n)璁婏紝鑰屽皣EDI鎶�琛�(sh霉)鎳�(y墨ng)鐢ㄤ簬瀵�(sh铆)椹�(y脿n)瀹ゅ皬鍨嬫按铏曠悊闋�(l菒ng)鍩�锛�EPED锛堟槗鏅槗閬�(d谩)锛夋啈鍊熸妧琛�(sh霉)鐨勪笉鏂锋敼閫�(j矛n)锛岃蛋鍦ㄤ簡琛屾キ(y猫)鐨勫墠娌�銆�
EPED-2RE-T绱旀按瑷�(sh猫)鍌欓噰鐢ㄥ井闆昏叇鎺у埗銆佸叿鍌欏叏鑷嫊(d貌ng)鍜屽崐鑷嫊(d貌ng)瑷�(sh猫)缃姛鑳�
澶氬��(g猫)閬�(y霉n)琛屽弮鏁�(sh霉)鐙�鎱�(t脿i)鍦ㄧ窔鐩�(ji膩n)鎺с�佸畨鍏ㄥ彲闈犮��
·鐢�(ch菐n)姘存按璩�(zh矛)绌�(w臎n)瀹氭�ч珮
·涓嶉渶瑕佸寲瀛�(xu茅)钘ュ妷鍐嶇敓
·閬�(y霉n)琛屾垚鏈綆寤�
·妯″鍖栫敓鐢�(ch菐n)锛屽苟鍙(sh铆)鐝�(xi脿n)PLC鑷嫊(d貌ng)鎺у埗銆�
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鍨嬭櫉(h脿o) |
鐥曢噺鍒嗘瀽鍨嬭秴绱旀按
EPED-2RE-30/60/100TH |
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宸ヤ綔姊濅欢 |
閫�(j矛n)姘达細鑷締(l谩i)姘� |
|
婧害锛�5~40鈩�闆绘簮锛�220V 50Hz 80~150W |
|
椤ず鍣� |
瀵睆鍥涜娑叉櫠椤ず锛氭簮姘�銆佺敘(ch菐n)姘存按璩�(zh矛)鍙冩按銆佹按婧�佸彇姘存檪(sh铆)闁� |
|
鍑烘按娴侀�� |
30/60/100L/H(1.5~2L/min)
鈮�3ppb
锛�1cfu/ml |
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TOC |
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寰敓鐗� |
|
閬�(gu貌)婵惧櫒 |
閬搁厤0.2/0.1/0.05绲傜閬�(gu貌)婵惧櫒 |
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閬╃敤闋�(l菒ng)鍩� |
鐥曢噺鍒嗘瀽鍨嬶細鐭冲ⅷ鐖愬師瀛愬惛鏀讹紙GFAAS锛�銆侀珮鏁堟恫鐩歌壊璀滐紙HPLC锛�銆佺瓑闆㈠瓙璩�(zh矛)璀滐紙ICP-MS锛�銆侀洟瀛愯唱(zh矛)璀滐紙IC锛夈��TOC鍒嗘瀽銆佺棔閲忛噾灞娓�(c猫)銆佸浐鐩歌悆?銆�?SPAN lang=EN-US>SPE锛�锛� |
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鍒嗘瀽鍨嬶細鍘熷瓙鍚告敹鍏夎瓬锛�AAS锛夊井鐢熺墿鍒嗘瀽銆佹櫘閫氬寲瀛�(xu茅)銆侀浕鎰熻�﹀悎绛夐洟瀛愬厜璀滃剙锛�ICP-AES锛� |
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鐢�(ch菐n)姘撮浕闃荤巼 |
18.25M惟.cm |
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瑕�(gu墨)鏍煎褰� |
鏌滃紡 |